SIOM Fabricates Large-Area, Wide-Angle, Broadband AR Metasurface Using Nanoimprint Lithography
A team from the Department of High-Power Laser Component Technology and Engineering at the Shanghai Institute of Optics and Fine Mechanics (SIOM) used nanoimprint lithography to fabricate large-area, double-sided fused-silica nanopillar metasurfaces, achieving broadband, wide-angle antireflection from the visible to near-infrared, along with good high-temperature stability and laser damage tolerance.
Why we recommend it: The original article provides a scalable nanoimprint process and laser damage tolerance, offering practical value for high-power laser optics