ASML said its existing 2027 and 2028 supply plans cannot fully meet customer demand and that it is studying a further expansion of 2028 capacity beyond the previously planned 30% increase. Quarterly sales through September 27 were EUR 11.7 billion, up more than 50% year over year. The NXE:3800F EUV lithography system slated for introduction next year will raise productivity from 230 to 260 wafers per hour.
Why we recommend it: Capacity expansion and productivity upgrades are proceeding in parallel, offering concrete industry clues on how AI demand translates into EUV lithography equipment supply constraints.
Oct 12Mon
Monday
OFweek Optics Network · NewsOptics industryOptics and AIPicksAI score6565
Kunyou Optoelectronics announced the completion of a C+ round exceeding 1 billion yuan, with investors undisclosed. The company's 12-inch wafer-level optics production line in Lingang, Shanghai, built with an investment of 2 billion yuan, is expected to be completed and come online in 2027, targeting AR, fiber optics, optical communications, automotive optics and optical computing markets. This follows its C round in January 2026 and a C+ round of nearly 400 million yuan in April.
Why we recommend it: The article lists three funding rounds this year and progress on the 12-inch wafer-level optics line, helping understand capital and capacity deployment in wafer-level optics
Sep 24Thu
Thursday
Shanghai Institute of Optics and Fine Mechanics (SIOM) · Research UpdatesOptics industryPicksAI score6363
A team from the Department of High-Power Laser Component Technology and Engineering at the Shanghai Institute of Optics and Fine Mechanics (SIOM) used nanoimprint lithography to fabricate large-area, double-sided fused-silica nanopillar metasurfaces, achieving broadband, wide-angle antireflection from the visible to near-infrared, along with good high-temperature stability and laser damage tolerance.
Why we recommend it: The original article provides a scalable nanoimprint process and laser damage tolerance, offering practical value for high-power laser optics
Sep 15Tue
Tuesday
Shanghai Institute of Optics and Fine Mechanics (SIOM) · Research UpdatesOptics industryPicksAI score6969
The Shanghai Institute of Optics and Fine Mechanics and Harbin Institute of Technology have used a photon sieve to achieve the first absolute wavefront measurement of an EUV light source, solving the challenge of absolute wavefront measurement for extreme-ultraviolet and soft X-ray sources.
A team led by Professor Luo Sida at Beihang University has developed a fabrication method for laser-induced graphene smart honeycombs with designable structures, allowing control of cell size, shape and graphene clusters. The process combines graphene paper, polyurethane film lamination and resin impregnation and curing, producing structures of about 150×100×10 mm3 and honeycombs with cell sizes from 2 mm to 5 mm. The team also explored applications of a wing-section model in anti-icing and de-icing, pressure sensing and electromagnetic shielding.
Why we recommend it: Linking laser processing parameters, honeycomb geometry and resin content to performance control offers a process approach for transferring 2D material processing to customizable 3D structures.
Focuslight addresses Mini and Micro LED process challenges through laser mass transfer, mass welding and chip repair, with key factors being spot control, energy uniformity and closed-loop temperature control. The Flux H system for mass welding uses a 4000-10000W, 976nm light source, with spot length and width adjustable in segments from 2 mm to 200 mm and energy uniformity above 97%. The Flux H system for chip repair uses a 30-150W, 976nm light source, with a 365um×105um spot and energy uniformity above 90%.
Why we recommend it: Mapping mass transfer, welding and repair to spot and thermal management requirements provides a concrete method for working backward from display manufacturing bottlenecks to laser system design parameters.
Jul 7Fri
Friday
Guangdian Hui · TrendsOptics industryOptics and AIPicksAI score6161
Suda Weige announced the successful delivery of an independently developed large direct-write lithography system for lithographic manufacturing of materials used in photonic chips, optical communications and optical chips. The system supports real-time 3D navigation autofocus on large-area substrates, proximity effect compensation during exposure and other functions. Several more large lithography system contracts are awaiting delivery. The company also plans to transfer 100% of Huarisheng for 550 million yuan, concentrating resources on micro- and nano-optics equipment and materials.
Why we recommend it: The equipment delivery and the planned exit from the reflective materials business together show a path of concentrating resources in micro- and nano-manufacturing, useful for understanding Suda Weige's technology portfolio and commercialization direction.