ASML said its existing 2027 and 2028 supply plans cannot fully meet customer demand and that it is studying a further expansion of 2028 capacity beyond the previously planned 30% increase. Quarterly sales through September 27 reached €11.7 billion, up more than 50% year on year. The NXE:3800F EUV lithography system slated for introduction next year will raise productivity from 230 to 260 wafers per hour.
Why we recommend it: Equipment expansion and productivity upgrades are proceeding in parallel, offering concrete industry clues on how AI demand feeds into EUV lithography supply constraints.
Oct 12Mon
Monday
OFweek Optics Network · NewsOptics industryOptics and AIPicksAI score6565
Kuang-Chi Photonics has announced the completion of a C+ funding round exceeding RMB 1 billion, with investors undisclosed. The company's 12-inch wafer-level optics production line, backed by a RMB 2 billion investment in Shanghai Lingang, is expected to be completed and come online in 2027, targeting the AR, fiber optics, optical communications, automotive optics and optical computing markets. This follows its C round in January 2026 and a C+ round of nearly RMB 400 million in April.
Why we recommend it: The source lists three funding rounds within the year and progress on the 12-inch wafer-level optics production line, helping to understand capital investment and capacity planning in wafer-level optics
Sep 24Thu
Thursday
Shanghai Institute of Optics and Fine Mechanics (SIOM) · Research UpdatesOptics industryPicksAI score6363
A team from the High-Power Laser Component Technology and Engineering Department at the Shanghai Institute of Optics and Mechanics used nanoimprint lithography to fabricate large-area, double-sided fused-silica nanopillar metasurfaces, achieving broadband, wide-angle antireflection from the visible to the near-infrared, along with good high-temperature stability and laser damage tolerance.
Why we recommend it: The original paper presents a scalable nanoimprint process and laser damage tolerance, offering practical value for high-power laser optics
Sep 15Tue
Tuesday
Shanghai Institute of Optics and Fine Mechanics (SIOM) · Research UpdatesOptics industryPicksAI score6969
SIOM and Harbin Institute of Technology have used a photon sieve to achieve the first absolute wavefront measurement of an EUV light source, solving a long-standing challenge in absolute wavefront metrology for extreme-ultraviolet and soft X-ray sources.
A team led by Professor Luo Sida at Beihang University has developed a fabrication method for structurally designable laser-induced graphene smart honeycombs, allowing control of cell size, shape and graphene clusters. The process combines graphene paper, polyurethane film lamination and resin impregnation curing to produce structures of about 150×100×10 mm3 with honeycomb cell sizes from 2 mm to 5 mm. The team also explored applications of wing cross-section models in anti-icing and de-icing, pressure sensing and electromagnetic shielding.
Why we recommend it: Linking laser processing parameters, honeycomb geometry and resin content to performance control offers a process approach for transferring 2D material processing to customizable 3D structures.
Focuslight addresses Mini and Micro LED process challenges with laser mass transfer, mass welding and chip repair, with key factors being spot shaping, energy uniformity and closed-loop temperature control. The Flux H system for mass welding uses a 4000-10000W, 976nm source, with spot length and width adjustable in segments from 2mm to 200mm and energy uniformity >97%. The Flux H system for chip repair uses a 30-150W, 976nm source, with a 365um×105um spot and energy uniformity >90%.
Why we recommend it: By mapping mass transfer, welding and repair to spot and thermal management requirements, it offers a concrete method for working backward from display manufacturing bottlenecks to laser system design parameters.
Jul 7Fri
Friday
Guangdian Hui · TrendsOptics industryOptics and AIPicksAI score6161
SVG announced the successful delivery of an in-house developed large direct-write lithography system for lithographic manufacturing of materials used in photonic chips, optical communications and optical chips. The system supports real-time 3D navigation autofocus for large-area substrates, proximity effect compensation and other functions, with several large lithography system contracts awaiting delivery. The company also plans to transfer 100% of the equity of Huari Sheng for RMB 550 million, concentrating resources on micro/nano optics-related equipment and materials.
Why we recommend it: The equipment delivery and the planned exit from the reflective materials business together show a path of concentrating resources in micro/nano manufacturing, useful for understanding SVG's technology portfolio and commercialization direction.